Morihisa Hoga: search on Z-Library

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1

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - From GDSII to OASIS: practical support tools for data processing flow transition

Endo, Masakazu, Hoga, Morihisa, Nishizawa, Kuninori, Kato, Kokoro

Year:

2006

Language:

english

File:

PDF, 128 KB

english, 2006

2

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - 6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Hoga, Morihisa, Zurbrick, Larry S., Montgomery, M. Warren, Fukuda, Masaharu, Chiba, Tsuyoshi, Ishikawa, Mikio, Itoh, Kimio, Kurihara, Masaaki, Toyama, Nobuhito, Hayashi, Naoya

Year:

2009

Language:

english

File:

PDF, 13.39 MB

english, 2009

3

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Inverse Lithography Technology (ILT): what is the impact to the photomask industry?

Pang, Linyong, Liu, Yong, Abrams, Dan, Hoga, Morihisa

Year:

2006

Language:

english

File:

PDF, 2.20 MB

english, 2006

4

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Resist and etch modeling for the 45nm node

Drapeau, Martin, Hoga, Morihisa, Beale, Dan

Year:

2006

Language:

english

File:

PDF, 1.56 MB

english, 2006

5

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Development of New Stream Format with GDSII Upper Compatibility and High-Compression Rate

Kuriyama, Koki, Grenon, Brian J., Kimmel, Kurt R., Hirumi, Junji, Yoshioka, Nobuyuki, Hojo, Yutaka, Kawase, Yuichi, Hara, Shigehiro, Hoga, Morihisa, Watanabe, Satoshi W., Inoue, Masaru, Kawase, Hidemu

Year:

2002

Language:

english

File:

PDF, 117 KB

english, 2002

6

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - 6-inch circle template fabrication for patterned media

Itoh, Kimio, Montgomery, M. Warren, Maurer, Wilhelm, Hoga, Morihisa, Toyama, Nobuhito

Year:

2010

Language:

english

File:

PDF, 4.72 MB

english, 2010

7

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Dark field Double Dipole Lithography (DDL) for 45nm node and beyond

Hsu, Stephen, Hoga, Morihisa, Burkhardt, Martin, Park, Jungchul, Van Den Broeke, Douglas, Chen, J. Fung

Year:

2006

Language:

english

File:

PDF, 784 KB

english, 2006

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - RET masks for patterning 45nm node contact hole using ArF immersion lithography

Hsu, Michael, Hoga, Morihisa, Chen, J. Fung, Van Den Broeke, Doug, En Tszng, Shih, Shieh, Jason, Hsu, Stephen, Shi, Xuelong

Year:

2006

Language:

english

File:

PDF, 988 KB

english, 2006

9

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Model based insertion of assist features using pixel inversion method: implementation in 65nm node

Hung, Chi-Yuan, Hoga, Morihisa, Liu, Qingwei, Sakajiri, Kyohei, Shang, Shumay D., Granik, Yuri

Year:

2006

Language:

english

File:

PDF, 1.66 MB

english, 2006

10

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Lithography process window enhancement using integrated design defect detection and fix

Su, Bo, Hoga, Morihisa, Ma, Melody, Vikram, Abhishek, Volk, William, Du, Hong, Verma, Gaurav, Morse, Richard, Chu, Chih-wei, Tsao, Becky, Lin, Char, Chou, Jacky, Tsai, Sidney

Year:

2006

Language:

english

File:

PDF, 743 KB

english, 2006

11

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - EUV mask development status at ASET and DNP

Abe, Tsukasa, Hoga, Morihisa, Fujii, Akiko, Mohri, Hiroshi, Hayashi, Naoya, Tanaka, Yuusuke, Nishiyama, Iwao

Year:

2006

Language:

english

File:

PDF, 678 KB

english, 2006

12

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Optimization of TaSix absorber stack for EUV mask

Tamura, Shinpei, Kanayama, Koichiro, Nishiyama, Yasushi, Matsuo, Tadashi, Tamura, Akira, Hoga, Morihisa

Year:

2006

Language:

english

File:

PDF, 294 KB

english, 2006

13

Fabrication of Au nanorod and nanogap split-ring structures by reactive-monolayer-assisted thermal nanoimprint lithography involving electrodeposition

Tomioka, Tatsuya, Kubo, Shoichi, Nagase, Koichi, Hoga, Morihisa, Nakagawa, Masaru

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2012

Language:

english

File:

PDF, 3.14 MB

english, 2012

14

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Measurement tool influence on CD results on photolithographic masks

Richter, Jan, Hoga, Morihisa, Liebe, Roman, Laske, Frank, Rudolf, Jens, Heins, Torben

Year:

2006

Language:

english

File:

PDF, 247 KB

english, 2006

15

Eigenanalysis of morphological diversity in silicon random nanostructures formed via resist collapse

Naruse, Makoto, Hoga, Morihisa, Ohyagi, Yasuyuki, Nishio, Shumpei, Tate, Naoya, Yoshida, Naoki, Matsumoto, Tsutomu

Journal:

Physica A: Statistical Mechanics and its Applications

Year:

2016

Language:

english

File:

PDF, 1.69 MB

english, 2016

16

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Development of LEEPL 6025 format mask blanks

Aritsuka, Yuuki, Tanabe, Hiroyoshi, Iimura, Yukio, Hoga, Morihisa, Sano, Hisatake

Year:

2003

Language:

english

File:

PDF, 499 KB

english, 2003

17

Optical nano artifact metrics using silicon random nanostructures

Matsumoto, Tsutomu, Yoshida, Naoki, Nishio, Shumpei, Hoga, Morihisa, Ohyagi, Yasuyuki, Tate, Naoya, Naruse, Makoto

Journal:

Scientific Reports

Year:

2016

Language:

english

File:

PDF, 809 KB

english, 2016

18

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Pore size control of alumina membrane mask

Ting, Yung-Chiang, Shy, Shyi-Long, Hoga, Morihisa

Year:

2006

Language:

english

File:

PDF, 633 KB

english, 2006

19

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Optimization of Alt-PSM structure for 100-nm-node ArF lithography: II

Mesuda, Kei, Toyama, Nobuhito, Narukawa, Syogo, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Hoga, Morihisa, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 356 KB

english, 2002

20

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Photomask dry-etching techniques for hard mask

Kwon, Sung-Won, Hoga, Morihisa, Park, Young-Ju, Kim, Sung-Yoon, Lee, Han-shin, Kwon, Hyuk-Joo, Choi, Seung-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 338 KB

english, 2006

21

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Advanced photomask repair technology for 65-nm lithography

Aramaki, Fumio, Hoga, Morihisa, Kozakai, Tomokazu, Sugiyama, Yasuhiko, Muramatsu, Masashi, Koyama, Yoshihiro, Matsuda, Osamu, Suzuki, Katsumi, Okabe, Mamoru, Hagiwara, Ryoji, Yasaka, Anto, Adachi, Tat

Year:

2006

Language:

english

File:

PDF, 714 KB

english, 2006

22

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Fine pixel SEM image for mask pattern quality assurance based on lithography simulation

Yamanaka, Eiji, Hoga, Morihisa, Kariya, Mitsuyo, Yamaguchi, Shinji, Tanaka, Satoshi, Hashimoto, Kohji, Itoh, Masamitsu, Kobayashi, Hideaki, Kawashima, Tsukasa, Narukawa, Shogo

Year:

2006

Language:

english

File:

PDF, 343 KB

english, 2006

23

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Quartz etch challenges for 45nm phase-shift masks

Anderson, Scott A., Hoga, Morihisa, Chandrachood, Madhavi, Grimbergen, Michael, Leung, Toi Yue Becky, Ibrahim, Ibrahim, Panayil, Sheeba, Kumar, Ajay

Year:

2006

Language:

english

File:

PDF, 501 KB

english, 2006

24

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Extended process window using variable transmission PSM materials for 65-nm and 45-nm node

Koepernik, Corinna, Hoga, Morihisa, Becker, Hans, Birkner, Robert, Buttgereit, Ute, Irmscher, Mathias, Nedelmann, Lorenz, Zibold, Axel

Year:

2006

Language:

english

File:

PDF, 828 KB

english, 2006

25

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Lithography process margin enhancement using illumination based assist pattern

Moon, James, Hoga, Morihisa, Lee, Dong-Jin, Sim, Gui-Hwang, Eum, Jae-Doo, Nam, Byung-Ho, Yim, Dong Gyu

Year:

2006

Language:

english

File:

PDF, 595 KB

english, 2006

26

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor

Takeshi, Kazumasa, Hoga, Morihisa, Oono, Kazuto, Negishi, Yoshiyuki, Inokuchi, Daisuke, Tanaka, Keishi, Tamura, Akira

Year:

2006

Language:

english

File:

PDF, 968 KB

english, 2006

27

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Experimental characterization of constituent errors in electron-beam lithography

Cinque, Russell, Hoga, Morihisa, Buck, Peter, Yeo, Kyungsoo S., Komagata, Tadashi, Nakagawa, Yasutoshi

Year:

2006

Language:

english

File:

PDF, 286 KB

english, 2006

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement

Wilcox, Nathan, Hoga, Morihisa, Vernon, Matt, Jamieson, Andrew

Year:

2006

Language:

english

File:

PDF, 235 KB

english, 2006

29

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Mask pattern correction to compensate for the effect of off-axis incidence in EUV lithography

Sugawara, Minoru, Nishiyama, Iwao, Hoga, Morihisa

Year:

2006

Language:

english

File:

PDF, 428 KB

english, 2006

30

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging

Iwase, Kazuya, Hoga, Morihisa, Ozawa, Ken, Uesawa, Fumikatsu

Year:

2006

Language:

english

File:

PDF, 298 KB

english, 2006

31

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

Yoshizawa, Masaki, Hoga, Morihisa, Philipsen, Vicky, Leunissen, Leonardus H. A., Hendrickx, Eric, Jonckheere, Rik, Vandenberghe, Geert, Buttgereit, Ute, Becker, Hans, Koepernik, Corinna, Irmscher, Mat

Year:

2006

Language:

english

File:

PDF, 572 KB

english, 2006

32

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Pattern fidelity enhancement with OPC pattern generation on laser lithography

Lee, Gaston, Hoga, Morihisa, Chung, Yi-Sheng, Yang, Wei-Tsung, Cheng, Wen-Hwa, Lin, Ren-Jang, Wang, Tsung Si, Cheng, Yuan-Cheng, Chou, Wei-Jen

Year:

2006

Language:

english

File:

PDF, 1.46 MB

english, 2006

33

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Hp45 lithography in consideration of the mask 3D effect

Sato, Kazuya, Hoga, Morihisa, Itoh, Masamitsu, Sato, Takashi

Year:

2006

Language:

english

File:

PDF, 344 KB

english, 2006

34

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Evaluation of mask data format standard OASIS.MASK developed for mask tools

Suzuki, Toshio, Nagaoka, Yoshinori, Maenaka, Yumiko, Vellanki, Venu, Ruch, Wayne, Mori, Masayoshi, Hattori, Keiko, Hosono, Kunihiro, Narukawa, Shogo, Hoga, Morihisa, Mohri, Hiroshi, Hosono, Kunihiro

Year:

2009

Language:

english

File:

PDF, 445 KB

english, 2009

35

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Pellicle-induced aberrations and apodization in hyper-NA optical lithography

Bubke, Karsten, Hoga, Morihisa, Alles, Benjamin, Cotte, Eric, Sczyrba, Martin, Pierrat, Christophe

Year:

2006

Language:

english

File:

PDF, 361 KB

english, 2006

36

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction

Zhang, Youping, Hoga, Morihisa, Feng, Mu, Liu, Hua-yu

Year:

2006

Language:

english

File:

PDF, 453 KB

english, 2006

37

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Study of mask-induced polarization effects on att. PSM in immersion lithography

Mizoguchi, Takashi, Hoga, Morihisa, Kojima, Yousuke, Takagi, Mikio, Saga, Tadashi, Haraguchi, Takashi, Konishi, Toshio, Fukushima, Yuuichi, Tanaka, Tsuyoshi, Okuda, Yoshimitsu

Year:

2006

Language:

english

File:

PDF, 264 KB

english, 2006

38

Nanomanufacturing of radial grating patterns by nanoimprint with a silicon mould for rotational angle measurement of micro gears

Kurokawa, Syuhei, Hoga, Morihisa, Doi, Toshiro

Journal:

International Journal of Nanomanufacturing

Year:

2012

Language:

english

File:

PDF, 2.93 MB

english, 2012

39

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - FPGA based high-speed system solutions for innovative maskless lithography systems

Voss, Sven-Hendrik, Hoga, Morihisa, Talmi, Maati

Year:

2006

Language:

english

File:

PDF, 385 KB

english, 2006

40

Special Section Guest Editorial: Photomask Manufacturing Technology

Shibuya, Masato, Hoga, Morihisa, Takehisa, Kiwamu

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 419 KB

english, 2016

41

SPIE Proceedings [SPIE 11th Annual BACUS Symposium on Photomask Technology - Sunnyvale, United States (Wednesday 25 September 1991)] 11th Annual BACUS Symposium on Photomask Technology - Advanced e-beam lithography system in producing high-quality reticle for 64M-DRAM

Kawasaki, Katsuhiro, Nakamura, Kazumitsu, Matsuzaka, Takashi, Ohta, Hiroya, Saitou, Norio, Kohno, Toshihiko, Hoga, Morihisa, McGinnis, Kevin C.

Year:

1992

Language:

english

File:

PDF, 600 KB

english, 1992

42

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - EUV mask process development and integration

Zhang, Guojing, Hoga, Morihisa, Yan, Pei-Yang, Liang, Ted, Du, Yan, Sanchez, Peter, Park, Seh-jin, Lanzendorf, Eric J., Choi, Chang-Ju, Shu, Emily Y., Stivers, Alan R., Farnsworth, Jeff, Hsia, Kangmin

Year:

2006

Language:

english

File:

PDF, 1.97 MB

english, 2006

43

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Metrology limits of mask process development

Nesladek, Pavel, Hoga, Morihisa, Wiswesser, Andreas, Sass, Björn, Richter, Jan

Year:

2006

Language:

english

File:

PDF, 379 KB

english, 2006

44

Characterization of Antisticking Layers for UV Nanoimprint Lithography Molds with Scanning Probe Microscopy

Kurihara, Masaaki, Hatakeyama, Sho, Yamada, Noriko, Shimomura, Takeya, Nagai, Takaharu, Yoshida, Kouji, Tomita, Tatsuya, Hoga, Morihisa, Hayashi, Naoya, Ohtani, Hiroyuki, Fujihira, Masamichi

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 466 KB

english, 2010

45

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique

Kajiya, Yoshihiko, Hoga, Morihisa, Nakamura, Akihiro, Yoshikawa, Masaya, Fujino, Takeshi

Year:

2006

Language:

english

File:

PDF, 593 KB

english, 2006

46

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Evaluating next-generation reticle demands on lithography equipment

Hoga, Morihisa, Nei, Masahiro, Ebinuma, Ryuichi, Aizaki, Naoaki

Year:

1997

Language:

english

File:

PDF, 138 KB

english, 1997

47

Fabrication of Graphene Network via Nanoimprint Lithography

Zou, Liumin, Konishi, Keita, Hoga, Morihisa, Yoh, Kanji

Journal:

MRS Proceedings

Year:

2012

Language:

english

File:

PDF, 427 KB

english, 2012

48

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Megasonic cleaning, cavitation, and substrate damage: an atomistic approach

Kapila, Vivek, Hoga, Morihisa, Deymier, Pierre A., Shende, Hrishikesh, Pandit, Viraj, Raghavan, Srini, Eschbach, Florence O.

Year:

2006

Language:

english

File:

PDF, 815 KB

english, 2006

49

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Development of a particle-detection system for phase-shifting masks

Shishido, Hiroaki, Matsumoto, Shunichi, Kenbo, Yukio, Hoga, Morihisa, Koizumi, Yasuhiro, Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 440 KB

english, 1996

50

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Reduction of MDP time through the improvement of verification method

Noh, Young-Hwa, Hoga, Morihisa, Jang, Sung-Hoon, Ki, Won-Tai, Choi, Ji-Hyeon, Choi, Seong-Woon, Han, Woo-Sung

Year:

2006

Language:

english

File:

PDF, 1.32 MB

english, 2006

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